Magnetron sputtering cathodes for magnetron sputtered thin films - 2" target

General specifications

Target Size		46mm OD x 3mm thick
Backing Plate		50mm OD x 3mm thick
Magnetic material		Fe : 1.0mm thick
		Ni : 3mm thick
Erosion diameter		SW:46mm, PP:40mm
Mounting style
Internal		25.4mm OD 300mm long shaft
External		DN100-ISO
Operating Pressure		1~10 x 10^-3 mbar
Power connection		N type
Cable		RG393
Max. DC		1kw, DC/pulsed DC
Max. RF^*1		200W with RG393 cable
Water tube		1/4" PFA
Water requirements		1 litre/min per kw, 3 bar max.
		No deionized water required
Note1) RF option available for more than 200WRF All specifications vary depending on the process, target materials...etc. Please contact Sales for details.

SWPP50 Internal Shaft Mount

Available Options

Magnetic Options
Balanced (SW50) / Unbalanced (PP50) Option
High Strength Option (HS)
Low Strength Option (LS)
LOOP for magnetic materials Option (LP)
RF Option (RF)

Mechanical Options
Tilting Option : +/-30 degrees
Ar Gas Injection
Sputter Chimney
Shutter Option

Product Specs

SW/PP50 - 2"

SW/PP75 - 3"

SW/PP100 - 4"

SW/PP150 - 6"

SW/PP200 - 8"

SW/PP250 - 10"

SW/PP300 - 12"

SW/PP400 - 16"