Process control for TCO's

Q. Sputtering apllications and especially TCO applications both with ceramic and metallic targets. I want to control my process better.
I have MRC 943.
I am looking for some informations about Speedflo system.
Is it possible with this kind of installations ?

A. Yes Speedflo is designed to control reactive sputtering processes. It can also be used in non-reactive processes for better long term stability.
So if you run from a metallic target with O2 then that is reactive and it will increase rates and produce more controlled films.
If you run from ceramic, with say a small amount of O2, it can monitor the level of metal and O2 in the plasma and control stoichiometry over the long term.

Measuring a DC self bias in an RF plasma

Q. I am trying to measure a DC self-bias on a floating substrate whilst I am running an RF plasma on the magnetron. With a voltmeter connected to earth I get a high positive voltage. Can you advise me how to do this.

A. If you have a digital oscilloscope the easiest thing is to  connect it to the "raw" bias, you should be able to see the type of signal you are receiving. By simple average of numerical values over a complete period (or entire number of periods) you'll get the DC bias. If you don't have that, please download the instructions on making a RF filter - located on the main FAQ page.