Gencoa's current main market segment is the solar energy sector. Our >45% target use for HY planars is at use in producing metal, compound and TCO layers in DC, pulsed and RF power modes. The FFE type magnetrons are used in critical reactive and CIGS processes. Our gas bar anodes are widely used for delivering better uniformity of layers via the unique gas distribution design.

To enhance the productivity of production machines, the Speedflo unit is used in several areas and general condition monitoring:

• Oxygen feedback control for TCO layers via PEM and O2 sensors (Lamdha). 
• Atomic absorption and EIES for CIGS processes
• Plasma emission Spectroscopy for rate feedback control and stoichiometry balance

Although silicon cell technology still dominates the installed base its costs have increased hence thin film solar cells have a great opportunity to gain market share. For the production of a-Si, CIGS & CdTe based thin film structures, sputtering is a heavily used method.

The reason for our strength in this sector is that the demands call on many of Gencoa's inherent capabilities:

• 3D magnetic and plasma modelling to predict and optimize performance
• Choice of magnetic systems depending upon the application- HY, FFE,  MZ
• Thick targets with optimum target use
• Low profile anodes - no electrical shorts & fewer defects
• Nodule free - clean targets for AZO and i-ZnO with FFE magnetrons
• High frequency designs for AZO and i-ZnO - standard designs have 10mm dielectric walls and 20mm surface path capable to handle high RF powers
• Highly robust industrial product - M8 screws and bearing materials for screw action
• High uniformity argon gas bars and fast response reactive gas bars
• Water cooled anodes to reduce heat load on plastic substrates
• Careful design of the magnetic field and anode interaction to reduce heat and damage to the growing film 
• Highly developed cantilever support designs - for flexible solar solutions

Gencoa produce rectangular cathodes in any size based upon 25mm width and length increments. But there are a range of popular sizes of cathode used in photovoltaic processing. The following are target size examples:

• 125 x 750 / 950, 12-16mm thick targets with >45% target use
• 150 x 1550, 12-20mm thick targets for RF compound deposition and RF SiO2,40-60% target use depending upon the magnetic system
• 200 x 950 /1600, 14-25mm thick targets, alloy & metal films, 40-55% target use

So if you are one of the new entrants to the photovoltaic sector or an established company looking for sputter solutions, please don't hesitate to contact Gencoa and we will arrange for a face to face meeting to illustrate in depth our exceptional capabilities.