Rotatable magnetrons have advantages over planar magnetrons in terms of target life and cleanliness of the target surface. This cleanliness is most important when sputtering oxides from either ceramic oxide targets or with reactive process gases. It results in better long term stability and fewer defects in the growing film. By combining our comprehensive range of magnetic systems and anodes with the Speedflo process controller, Gencoa provides the complete and guaranteed solution. Our experience covers a wide range of process types and we have supported our customers on-site by providing process and hardware set-up and tuning. Gencoa has 4 process support scientists to ensure that you make the most of your investment and achieve success in the shortest possible time. Here's what some of customers say:
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"Gencoa’s sputtering expertise is unimpeachable. Switching to Gencoa’s High Yield magnetrons doubled our target utilization and campaign lengths. Speedflo enabled us to implement reactive sputtering in an electrically noisy industrial environment with no vacuum system modifications. With Speedflo, control of a reactive sputtering within a very tight process window was rapidly demonstrated. All along the way, Gencoa has demonstrated an exceptionally high level of cooperation and willingness to make things right". Senior Process Engineer, Major PV manufacturer.
"Thanks for the great and timely support. The Speedflo controller gives us flexibility for many control options and is working splendidly and the data supplied matches closely to our models. Looking forward to working closely with Gencoa in the near future". Senior Design Engineer, PV cell producer
"Gencoa magnetrons and controllers have improved our sputter processes by increasing rate as well as stabilizing long-term composition. They are always available to come to our location to support us when required and provide solid technical know-how". Senior Process Scientist, PV manufacturer
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The range of sensors and sophisticated process control software features allows the operator to gain control of even the most challenging processes. Gencoa offer on-site process tuning as well as training to customers to achieve the most effective modes of operation and the best return on investment. Our process skills and experience are invaluable in achieving success.
The use of fast feedback process control can hold the unstable reactive sputtering process at any point on the hysteresis curve enabling enhancements to the deposition rate. Below is an example of PEM based sensing and control for a dual rotatable magnetron and the increase in rates possible.
Another key feature of the process control for large area reactive sputtering is the ability to tune different gas zones down the length of the rotatable magnetrons in order to improve the coating uniformity. The gas bar designs also play a very important part in ensuring a fast feedback response as well as uniform distribution with the different gas zones. Typically for magnetrons less than 1m in length a single gas zone can ne effective. For larger magnetrons 3 or 5 zones can be used with corresponding sensors measuring the different zones.
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ISSP 09
