Full Face Erosion Magnetron Cathodes (FFE)

Gencoa Full Face Erosion (FFE) Source is designed specifically to sputter the full target face even in reactive deposition mode.

General Features Magnetic Field: Scanning. Target Size:          - Circular 2 - 15 inch (50 - 300mm).        - Rectangular Any Size, wider than 100mm. Target Fix: Clamped: indirectly cooled, see below. Magnet Array: NdFeB (not in water). Magnetic Strength: 300 - 400 over the target surface. Operating Range: 1 x 10-3mbar (0.1 Pa). Ultimate Pressure: 10-8mbar (10-6Pa). Water Couplings: 2 x 1/4 - 1/2 inch or 6 - 12mm Swagelok. Cooling Water: 1 litres/min/kW - 3 bar max. No de-ionised water needed. Power Type: DC, RF, DC pulse, AC MFR. Power Connection: N-type, HN, 7/16" or custom.

The Full Face Erosion (FFE) source in circular and rectangular form offers very high target use, 65% - 80%. There are no re-deposit areas on the target surface hence defects are minimised in the coating. Also the whole target can be maintained in metal mode in reactive sputtering leading to enhanced rate, plasma stability and defect reduction.
In reactive dielectric coating deposition there will be no chance to build up on the target surface since the target is maintained in metallic mode.

Target Mounts:
       Clamped indirect & Direct cooling all possible, as standard.
       Please also refer to a page Target Mounting Option in Process tips.