Unbalanced Magnetic Option (PP)  

Unbalanced magnetic field. Conventional 2 pole magnetic array. Increases plasma reactivity. Aids compound formation. Densify coatings. Suitable for all ion assisted process Specify optimum plasma release to the substrate. Substrate temperature will be increased. Possible to combine with all other options except for SW option.

The unbalanced magnetic array changes the shape of the magnetic field to allow release of some of the plasma electron towards the substrate to provide ion assistance for the coating process. This release can be a 'maximum' or can be tuned to a certain level through the magnetic design. Since the field shape changes, so does the position of the outer edge of the race-track, hence the outer diameter of an unbalanced (PP type) magnetic array is much larger than a balanced (SW type) magnetic array in order to ensure sputtering to the outer edge of the target. Gencoa circular magnetrons are hence 'over-sized' in order to accept any type of magnetic array without compromising the process efficiency, target use and uniformity.

Where ion assistance for the coating process is required, the use of the unbalanced magetron in combination with magnetic lining between magnetrons can be the most effective solution. The magnetrons create the ionisation in the plasma and the magnetic linking between cathodes either confines the plasma ionisation or directs it to the required location. Multiple magnetron systems used for Hard and Decorative Coating will require both unbalanced magnetics and  system magnetic confinement. Gencoa have experience in combining magnetrons in the same chamber to optimize the coating process and improve adhesion, hardness and lustre of layers. The simulation is provided free-of-charge for magnetron purchasers. In addition we can provide process implementation.

Please also refer to  FE modelling and Balance & Unbalance.