Gencoa provide a range of plasma source technology based upon DC, AC and HIPIMS power modes, and for applications including pre-cleaning, coating removal and ion beam deposition.
Gencoa's linear ion sources offer a robust and flexible means of pre-cleaning polymer and glass substrates before the application of PVD coatings.
A compact, robust and simple to operate circular Ion Source with options for internal or external mounting for R&D and small substrate sizes.
An AC discharge plasma treater for high speed treatment of metallic substrates and very high speed treatment of polymer web.
A high power gas plasma source for substrate pre-treatment and radical assisted sputtering.
The IM3000 and IM300 offer a complete high voltage control package for circular and linear Ion Sources.