Plasma Sources
Gencoa provide a range of plasma source technology based upon DC, AC and HIPIMS power modes, and for applications including pre-cleaning, coating removal and ion beam deposition.
Linear ion source
Gencoa's linear ion sources offer a robust and flexible means of pre-cleaning polymer and glass substrates before the application of PVD coatings.
IMC75
A compact, robust and simple to operate circular Ion Source with options for internal or external mounting for R&D and small substrate sizes.
Plasma Treater
An AC discharge plasma treater for high speed treatment of metallic substrates and very high speed treatment of polymer web.
Activated oxygen plasma source
A high power gas plasma source for substrate pre-treatment and radical assisted sputtering.
Power supplies
The IM3000 and IM300 offer a complete high voltage control package for circular and linear Ion Sources.
Downloads
Gencoa Linear Ion Source flyer- IMC75 presentation
- Linear ion source presentation
- SVC Techcon 2022: Magnetron Based Plasma Substrate Pre-Treatment and Etching
Upcoming Events
- 21-26 June 2026 - The 19th International Conference on X-ray Absorption Fine Structure (XAFS2026)
- 30 June - 3 July 2026 - ISSP 2026
- 31 August - 3 September 2026 - Plasma Surface Engineering 2026
- 8-13 November 2026 - AVS 72nd International Symposium & Exhibition
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