Plasma Sources
Gencoa provide a range of plasma source technology based upon DC, AC and HIPIMS power modes, and for applications including pre-cleaning, coating removal and ion beam deposition.

Linear ion source
Gencoa's linear ion sources offer a robust and flexible means of pre-cleaning polymer and glass substrates before the application of PVD coatings.

IMC75
A compact, robust and simple to operate circular Ion Source with options for internal or external mounting for R&D and small substrate sizes.

Plasma Treater
An AC discharge plasma treater for high speed treatment of metallic substrates and very high speed treatment of polymer web.

Activated oxygen plasma source
A high power gas plasma source for substrate pre-treatment and radical assisted sputtering.

Power supplies
The IM3000 and IM300 offer a complete high voltage control package for circular and linear Ion Sources.
Downloads
Linear ion source presentation
IMC75 presentation
Gencoa Linear Ion Source flyer
SVC Techcon 2022: Magnetron Based Plasma Substrate Pre-Treatment and Etching
Latest Blog Posts

- 22/6/2022 - The Basic Theory of Magnetron Sputtering
- 15/2/2022 - Key Techniques for Gas Leak Detection
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