Circular FFE

Gencoa full face erosion (FFE) magnetics combine ultra-uniform films with clean target erosion by a scanning of the plasma over the target surface.

Two versions of the circular FFE are offered, with a unique design for target diameters of 75-200mm (3-8”) that is ideally suited to R&D and optics and can be ordered for internal of external mount.

For larger substrates, cathodes fitted with target diameters of 250mm (10") and above deliver superior uniformity control at low target-to-substrate separations – typically 50-70mm – to ensure a high rate of material transfer from the target to the substrate for rapid wafer metallizing.

Gencoa's range of FFE magnetrons overcome many of the traditional difficulties experienced when performing high-rate reactive deposition, such as nodule growth rates, whilst increasing the total target surface sputtering area.

High target use

Target use is high (>50% on a 6mm target), with a clean target even when reactive sputtering, and no redeposition areas on the target surface, fewer arcs and a lower number of coating defects. Target use of up to 70% can be achieved using the 6" circular FFE magnetron (FFE150).

Uniformity

A high rate of uniformity is achieved through motor driven dynamic plasma scanning to sputter the whole target surface, and maximum erosion at the outer edge of the target. There is no uniformity drift with target life.

The uniformity will vary with target-to-substrate separation. This can also be used to correct the uniformity as the target erodes and wafer size. The 12" circular FFE magnetron (FFE300) can deposit layers with 1-3% uniformity onto 200mm wafers.