Circular magnetron
Gencoa offer a comprehensive range of circular magnetrons, catering for applications from R&D to semiconductor production. A wide choice of magnetic and mechanical configurations deliver tailored solutions for each process.
3G Circular
A third generation of Gencoa HV sources, with internal gas injection, indirect or direct target water cooling and ±45° tilt adjustment.
Standard Circular
For target diameters of 6"-16", Gencoa offer an established design of circular magnetron, suitable for coating larger areas.
Circular FFE
A powerful tool for high-rate deposition of sputtered layers, with motor driven dynamic plasma scanning to deliver high target use.
Circular Vtech
The unique Vtech magnetron allows for variations of magnetic field properties to be applied. Available for target diameters of 2" to 6".
Downloads
3G circular magnetron flyer
Gencoa Circular FFE flyer
SVC Techcon 2022: Process Benefits of a Clean Sputter Target by Dynamic Plasma Movement on Circular Planar Magnetrons
Magnetic options for planar magnetrons
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