Circular magnetron

Gencoa offer a comprehensive range of circular magnetrons, catering for applications from R&D to semiconductor production. A wide choice of magnetic and mechanical configurations delivers tailored solutions for each process.

3G Circular

A third generation of Gencoa HV sources, with internal gas injection, indirect or direct target water cooling and ±45° tilt adjustment.

Standard Circular

For target diameters of 6"-16", Gencoa offer an established design of circular magnetron, suitable for coating larger areas.

Circular FFE

A powerful tool for high-rate deposition of sputtered layers, with motor driven dynamic plasma scanning to deliver high target use.

Circular Vtech

The unique Vtech magnetron allows for variations of magnetic field properties to be applied. Available for target diameters of 2" to 6".

Downloads

• 3G circular magnetron flyer
• Circular FFE flyer
• SVC TechCon 2021: The Full Range of Magnetic Array Options for Planar Magnetrons - Too Much Choice?
• SVC Techcon 2022: Process Benefits of a Clean Sputter Target by Dynamic Plasma Movement on Circular Planar Magnetrons

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