Plasma Sources
Gencoa provide a range of plasma source technology based upon DC, AC and HIPIMS power modes, and for applications including pre-cleaning, coating removal and ion beam deposition.
Linear ion source
Gencoa's linear ion sources offer a robust and flexible means of pre-cleaning polymer and glass substrates before the application of PVD coatings.
IMC75
A compact, robust and simple to operate circular Ion Source with options for internal or external mounting for R&D and small substrate sizes.
Plasma Treater
An AC discharge plasma treater for high speed treatment of metallic substrates and very high speed treatment of polymer web.
Activated oxygen plasma source
A high power gas plasma source for substrate pre-treatment and radical assisted sputtering.
Power supplies
The IM3000 and IM300 offer a complete high voltage control package for circular and linear Ion Sources.
Downloads
Gencoa Linear Ion Source flyer- IMC75 presentation
- Linear ion source presentation
- SVC Techcon 2022: Magnetron Based Plasma Substrate Pre-Treatment and Etching
Upcoming Events
- 31 August - 3 September 2026 - Plasma Surface Engineering 2026
- 2-4 September 2026 - Semicon Taiwan
- 11-14 October 2026 - EuroPM
- 10-13 November 2026 - Semicon Europa
- View full list >