Gencoa manufactures magnetron sputter cathodes (sources) to create thin film layers for the vacuum coating PVD (physical vapour (vapor) deposition) industry. Both circular and rectangular magnetron sputter target geometries are available as well as rotatable magnetron sputter target sources. Gencoa also manufacture reactive gas process controllers for plasma emission monitoring and high speed process control for high rate reactive magnetron sputtering based deposition. Magnetron sputter cathodes are used to deposit thin films for a wide variety of applications as magnetron sputtering is the most controllable and scalable of all the PVD thin film methods.