Gencoa planar magnetron
Reactive gas control with Speedflo

Dual rotatable magnetron plasma
 Linear Ion source for pre cleaning polymer and glass substrates prior to thin film deposition
Planar magnetron Speedflo Rotatable magnetron Ion Source
Rectangular and circular magnetrons for a wide range of target sizes, with a variety of magnetic options available. Highest target use and uniformity, highly robust and process ready. Perfect your process. Speedflo is a powerful reactive gas controller giving you control of your reactive sputtering and plasma processes. With flexible monitoring and feedback system for process optimization and coating properties.
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Integrated process solutions from planar and rotatable cathodes. Enhances TCO layer properties. Ultra-high rate reactive deposition.
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Robust and flexible means of pre-cleaning polymer and glass substrates prior to thin film deposition. The plasma jets generated impact the substrate.
Linear ion source >
IMC75 circular ion source >

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Magnetron sputtering technology by Gencoa. Click the link to download a copy of our brochure.
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