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| Planar magnetron | Speedflo™ | Rotatable magnetron | Ion Source | ||
| Rectangular and circular magnetrons for a wide range of target sizes, with a variety of magnetic options available. Highest target use and uniformity, highly robust and process ready. | Perfect your process. Speedflo is a powerful reactive gas controller giving you control of your reactive sputtering and plasma processes. With flexible monitoring and feedback system for process optimization and coating properties. More > |
Integrated process solutions from planar and rotatable cathodes. Enhances TCO layer properties. Ultra-high rate reactive deposition. More > |
Robust and flexible means of pre-cleaning polymer and glass substrates prior to thin film deposition. The plasma jets generated impact the substrate. More > | ||
Constant innovation, customer satisfaction, process support, in-depth understanding, industry experts. Simply better solutions. Gencoa.
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