Through our experience and extensive technical know-how, Gencoa are able to provide a complete sputtering solution in circular magnetron range. Gencoa Circular magnetron range mainly comes in three product range namely standard circular, full face erosion and Variable Vtech magnetron. Gencoa circular range is available from 2” and above on both internal shaft mount and external flange mounting with many other mechanical options. Please click on the product below for further information.
A third generation of HV sources for 2" to 5" target diameters, with internal gas injection, indirect or direct target water cooling and ±45° tilt adjustment as standard.
For target diameters of 6"-16", Gencoa offer an established design of circular magnetron, suitable for coating larger areas.
A unique and powerful tool for the high-rate deposition of sputtered layers with high target use achieved by the use of motor driven dynamic plasma scanning.
The unique Vtech magnetron allows for variations of magnetic field properties to be applied. Available for target diameters of 2" to 6".
- 29-31 August 2018 - Touch Taiwan 2018
- 5-8 September 2018 - China International Optoelectronic Exposition (CIOE)
- 17-21 September 2018 - Plasma Surface Engineering
- 11-12 October 2018 - Vacuum Expo
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